Invention Grant
- Patent Title: Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions
- Patent Title (中): 含氟化合物及其聚合物可用于抗反射膜材料和抗蚀剂组合物
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Application No.: US13094281Application Date: 2011-04-26
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Publication No.: US08691491B2Publication Date: 2014-04-08
- Inventor: Shinichi Sumida , Haruhiko Komoriya , Kazuhiko Maeda
- Applicant: Shinichi Sumida , Haruhiko Komoriya , Kazuhiko Maeda
- Applicant Address: JP Ube-shi
- Assignee: Central Glass Company, Limited
- Current Assignee: Central Glass Company, Limited
- Current Assignee Address: JP Ube-shi
- Agency: Crowell & Moring LLP
- Priority: JP2002-229552 20020807
- Main IPC: G03F7/004
- IPC: G03F7/004

Abstract:
A fluorine-containing compound represented by the formula 1, where R1 is a methyl group or trifluoromethyl group, each of R2 and R3 is independently a hydrogen atom or a group containing (a) a hydrocarbon group having a straight-chain, branched or ring form and having a carbon atom number of 1-25 or (b) an aromatic hydrocarbon group, the group optionally containing at least one of a fluorine atom, an oxygen atom and a carbonyl bond, l is an integer of from 0 to 2, each of m and n is independently an integer of 1-5 to satisfy an expression of m+n≦6, and when at least one of R1, R2 and R3 is in a plural number, the at least one of R1, R2 and R3 may be identical with or different from each other.
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