Invention Grant
- Patent Title: Reticle design for the reduction of lens heating phenomenon
- Patent Title (中): 掩模设计减少了镜片加热现象
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Application No.: US13401858Application Date: 2012-02-22
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Publication No.: US08691477B2Publication Date: 2014-04-08
- Inventor: Jianming Zhou , Anton Devilliers , Erik Byers
- Applicant: Jianming Zhou , Anton Devilliers , Erik Byers
- Applicant Address: TW Kueishan, Tao-Yuan Hsien
- Assignee: Nanya Technology Corp.
- Current Assignee: Nanya Technology Corp.
- Current Assignee Address: TW Kueishan, Tao-Yuan Hsien
- Agent Winston Hsu; Scott Margo
- Main IPC: G03F9/00
- IPC: G03F9/00 ; G03F1/44
Abstract:
A reticle for lens heating mitigation includes a substrate, a target pattern and a redistributive pattern. The substrate includes a live pattern region and the target pattern is disposed within the live pattern region for constructing the target pattern onto a wafer. The redistributive pattern is also disposed within the live pattern region for redistributing energy onto a lens without being printed onto the wafer and without correcting said target pattern to be printed onto the wafer.
Public/Granted literature
- US20130216795A1 RETICLE DESIGN FOR THE REDUCTION OF LENS HEATING PHENOMENON Public/Granted day:2013-08-22
Information query
