Invention Grant
US08691336B2 Coating treatment method, non-transitory computer storage medium and coating treatment apparatus
有权
涂层处理方法,非暂时性计算机存储介质和涂层处理装置
- Patent Title: Coating treatment method, non-transitory computer storage medium and coating treatment apparatus
- Patent Title (中): 涂层处理方法,非暂时性计算机存储介质和涂层处理装置
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Application No.: US13069522Application Date: 2011-03-23
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Publication No.: US08691336B2Publication Date: 2014-04-08
- Inventor: Kousuke Yoshihara , Katsunori Ichino
- Applicant: Kousuke Yoshihara , Katsunori Ichino
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Posz Law Group, PLC
- Priority: JP2010-089155 20100408; JP2011-025967 20110209
- Main IPC: B05D3/12
- IPC: B05D3/12 ; G06F19/00

Abstract:
A coating treatment method includes: a first step of discharging a coating solution from a nozzle to a central portion of a substrate while acceleratingly rotating the substrate, to apply the coating solution over the substrate; a second step of then decelerating the rotation of the substrate and continuously rotating the substrate; and a third step of then accelerating the rotation of the substrate to dry the coating solution on the substrate. In the first step, the acceleration of the rotation of the substrate is changed in the order of a first acceleration, a second acceleration higher than the first acceleration, and a third acceleration lower than the second acceleration to acceleratingly rotate the substrate at all times.
Public/Granted literature
- US20110250765A1 COATING TREATMENT METHOD, NON-TRANSITORY COMPUTER STORAGE MEDIUM AND COATING TREATMENT APPARATUS Public/Granted day:2011-10-13
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