Invention Grant
- Patent Title: Substrate lamination system and method
- Patent Title (中): 基板层压体系及方法
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Application No.: US12009375Application Date: 2008-01-18
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Publication No.: US08691043B2Publication Date: 2014-04-08
- Inventor: James D. Sampica , Paul R. Nemeth , Tracy J. Barnidge , Vincent P. Marzen
- Applicant: James D. Sampica , Paul R. Nemeth , Tracy J. Barnidge , Vincent P. Marzen
- Applicant Address: US IA Cedar Rapids
- Assignee: Rockwell Collins, Inc.
- Current Assignee: Rockwell Collins, Inc.
- Current Assignee Address: US IA Cedar Rapids
- Agent Donna P. Suchy; Daniel M. Barbieri
- Main IPC: B32B37/00
- IPC: B32B37/00

Abstract:
The present disclosure is directed to a substrate lamination system and method. A method for laminating substrates may comprise: (a) disposing a pressure-sensitive adhesive later between a substantially planar surface of a first substrate and a substantially planar surface of a second substrate; (b) disposing the first substrate, pressure-sensitive adhesive layer and second substrate within a vacuum chamber; (c) evacuating the vacuum chamber; (d) applying pressure to at least one of the first substrate and the second substrate. A system for laminating substrates may comprise: (a) means for disposing a pressure-sensitive adhesive layer between a substantially planar surface of a first substrate and a substantially planar surface of a second substrate; (b) means for disposing the first substrate, pressure-sensitive adhesive layer and second substrate within a vacuum chamber; (c) means for evacuating the vacuum chamber; (d) means for applying pressure to at least one of the first and second substrates.
Public/Granted literature
- US20090120572A1 Substrate lamination system and method Public/Granted day:2009-05-14
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