Invention Grant
US08690559B2 Nano-imprinting resin stamper and nano-imprinting apparatus using the same
失效
纳米压印树脂压模和使用其的纳米压印装置
- Patent Title: Nano-imprinting resin stamper and nano-imprinting apparatus using the same
- Patent Title (中): 纳米压印树脂压模和使用其的纳米压印装置
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Application No.: US13193666Application Date: 2011-07-29
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Publication No.: US08690559B2Publication Date: 2014-04-08
- Inventor: Satoshi Ishii , Masahiko Ogino , Noritake Shizawa , Kyoichi Mori , Akihiro Miyauchi
- Applicant: Satoshi Ishii , Masahiko Ogino , Noritake Shizawa , Kyoichi Mori , Akihiro Miyauchi
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2010-170379 20100729
- Main IPC: B29C43/56
- IPC: B29C43/56

Abstract:
The present invention provides a nano-imprinting resin stamper including a micro structure layer on a transmissive support basal material, the micro structure layer being formed of a polymer of a resin composition that contains a silsesquioxane derivative as a major constituent having a plurality of polymerizable functional groups, another polymerizable resin component having a plurality of polymerizable functional groups and different from the silsesquioxane derivative, and a photopolymerizable initiator, in which the content percentage of the photopolymerizable initiator is equal to or more than 0.3 mass % and equal to or less than 3 mass % relative to a total mass of the silsesquioxane derivative and the polymerizable resin component, and the micro structure layer permits equal to or more than 80% of light to pass therethrough at a wavelength of 365 nm.
Public/Granted literature
- US20120027884A1 NANO-IMPRINTING RESIN STAMPER AND NANO-IMPRINTING APPARATUS USING THE SAME Public/Granted day:2012-02-02
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