Invention Grant
- Patent Title: Regularization method for quantizing lithography masks
- Patent Title (中): 用于量化光刻掩模的正则化方法
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Application No.: US13425324Application Date: 2012-03-20
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Publication No.: US08689148B1Publication Date: 2014-04-01
- Inventor: P. Jeffrey Ungar , Ilhami H. Torunoglu
- Applicant: P. Jeffrey Ungar , Ilhami H. Torunoglu
- Applicant Address: US CA Palo Alto
- Assignee: Gauda, Inc.
- Current Assignee: Gauda, Inc.
- Current Assignee Address: US CA Palo Alto
- Agency: Aka Chan LLP
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
In an electronic design automation technique for optical proximity correction, an optimized mask function that has values other than those allowed for a particular mask type, such as 0 and 1 for a chrome-on-glass binary mask, evolves it to a solution restricted to these values or narrow intervals near them. The technique “regularizes” the solution by mixing in a new cost functional that encourages the mask to assume the desired values. The mixing in may be done over one or more steps or even “quasistatically,” in which the total cost functional and the mask is brought from pure goodness-of-fit to the printed layout for given conditions to pure manufacturability by keeping the total cost functional minimized step-by-step. A goal of this gradual mixing-in is to do thermodynamically optimal work on the mask function to bring it to manufacturable values.
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