Invention Grant
- Patent Title: Enhancing accuracy of fast high-resolution X-ray diffractometry
- Patent Title (中): 提高快速高分辨率X射线衍射的准确性
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Application No.: US13180568Application Date: 2011-07-12
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Publication No.: US08687766B2Publication Date: 2014-04-01
- Inventor: Matthew Wormington , Alexander Krohmal , David Berman , Gennady Openganden
- Applicant: Matthew Wormington , Alexander Krohmal , David Berman , Gennady Openganden
- Applicant Address: IL Migdal Ha'Emek
- Assignee: Jordan Valley Semiconductors Ltd.
- Current Assignee: Jordan Valley Semiconductors Ltd.
- Current Assignee Address: IL Migdal Ha'Emek
- Agency: D. Kligler I.P. Services Ltd.
- Main IPC: G01N23/20
- IPC: G01N23/20 ; G01T1/24
Abstract:
A method for analysis includes directing a converging beam of X-rays toward a surface of a sample and sensing the X-rays that are diffracted from the sample while resolving the sensed X-rays as a function of angle so as to generate a diffraction spectrum of the sample. The diffraction spectrum is corrected to compensate for a non-uniform property of the converging beam.
Public/Granted literature
- US20120014508A1 ENHANCING ACCURACY OF FAST HIGH-RESOLUTION X-RAY DIFFRACTOMETRY Public/Granted day:2012-01-19
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