Invention Grant
- Patent Title: Phase change memory and method for fabricating phase change memory
- Patent Title (中): 相变存储器和相变存储器的制造方法
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Application No.: US13487826Application Date: 2012-06-04
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Publication No.: US08687405B2Publication Date: 2014-04-01
- Inventor: Hajime Nakabayashi , Kenichi Oyama , Yoshihiro Hirota
- Applicant: Hajime Nakabayashi , Kenichi Oyama , Yoshihiro Hirota
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: JP2011-127522 20110607
- Main IPC: G11C11/00
- IPC: G11C11/00 ; H01L47/00 ; H01L21/20

Abstract:
A phase change memory includes an insulating layer on a substrate, an electrode layer having one pole and an electrode layer having another pole within the insulating layer, an opening portion whose lower portion on an upper portion of the insulating layer is substantially square or substantially rectangular, a phase change portion formed substantially parallel to a surface of the substrate along the respective sides of the lower portion of the opening portion, and two connection electrodes having a pole and connected to the phase change portion at two opposing corners of the lower portion of the opening portion connecting a diode portion connected to the electrode layer having one pole and the phase change portion, and two connection electrodes having another pole and connected to the phase change portion at the other two opposing corners connecting the phase change portion and the electrode layer having another pole.
Public/Granted literature
- US20120314493A1 PHASE CHANGE MEMORY AND METHOD FOR FABRICATING PHASE CHANGE MEMORY Public/Granted day:2012-12-13
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