Invention Grant
- Patent Title: Wavefront aberration measuring apparatus
- Patent Title (中): 波前像差测量装置
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Application No.: US14022762Application Date: 2013-09-10
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Publication No.: US08687179B2Publication Date: 2014-04-01
- Inventor: Tatsuro Otaki
- Applicant: Nikon Corporation
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JP2010-087351 20100405
- Main IPC: G01B9/00
- IPC: G01B9/00

Abstract:
A wavefront aberration measuring apparatus comprising: an illumination optical system provided to an incident side of a test lens; and a measuring optical system provided to an exit side of the test lens, the illumination optical system including an aperture stop capable of being opened and closed, and the illumination optical system being movable along an optical axis of the illumination optical system so as to adjust positions of the aperture stop and an entrance pupil of the test lens to have an optically conjugate relation with each other. Accordingly, it becomes possible to provide a wavefront aberration measuring apparatus capable of suppressing errors in measured result.
Public/Granted literature
- US20140009753A1 WAVEFRONT ABERRATION MEASURING APPARATUS Public/Granted day:2014-01-09
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