Invention Grant
- Patent Title: Bonding layer structure and method for wafer to wafer bonding
- Patent Title (中): 用于晶片到晶片接合的接合层结构和方法
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Application No.: US13571260Application Date: 2012-08-09
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Publication No.: US08686571B2Publication Date: 2014-04-01
- Inventor: Hsin-Ting Huang , Jung-Huei Peng , Shang-Ying Tsai , Li-Min Hung , Yao-Te Huang , Yi-Chuan Teng , Chin-Yi Cho
- Applicant: Hsin-Ting Huang , Jung-Huei Peng , Shang-Ying Tsai , Li-Min Hung , Yao-Te Huang , Yi-Chuan Teng , Chin-Yi Cho
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L23/48

Abstract:
A structure comprises a first semiconductor substrate, a first bonding layer deposited on a bonding side the first semiconductor substrate, a second semiconductor substrate stacked on top of the first semiconductor substrate and a second bonding layer deposited on a bonding side of the second semiconductor substrate, wherein the first bonding layer is of a horizontal length greater than a horizontal length of the second semiconductor substrate, and wherein there is a gap between an edge of the second bonding layer and a corresponding edge of the second semiconductor substrate.
Public/Granted literature
- US20140042625A1 BONDING LAYER STRUCTURE AND METHOD FOR WAFER TO WAFER BONDING Public/Granted day:2014-02-13
Information query
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