Invention Grant
US08686565B2 Stacked chip assembly having vertical vias 有权
具有垂直通孔的堆叠式芯片组件

Stacked chip assembly having vertical vias
Abstract:
An assembly and method of making same are provided. The assembly can be formed by stacking a first semiconductor element atop a second semiconductor element and forming an electrically conductive element extending through openings of the semiconductor elements. The openings may be staged. The conductive element can conform to contours of the interior surfaces of the openings and can electrically connect conductive pads of the semiconductor elements. A dielectric region can be provided at least substantially filling the openings of the semiconductor elements, and the electrically conductive element can extend through an opening formed in the dielectric region.
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