Invention Grant
- Patent Title: Object holding apparatus, and inspection apparatus
- Patent Title (中): 物体保持装置和检查装置
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Application No.: US13454897Application Date: 2012-04-24
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Publication No.: US08686383B2Publication Date: 2014-04-01
- Inventor: Kazuhiro Zama , Koichi Asami , Yusuke Miyazaki
- Applicant: Kazuhiro Zama , Koichi Asami , Yusuke Miyazaki
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2006-234631 20060830
- Main IPC: H01L21/68
- IPC: H01L21/68

Abstract:
In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.
Public/Granted literature
- US20120205850A1 SUBSTRATE HOLDING APPARATUS, AND INSPECTION OR PROCESSING APPARATUS Public/Granted day:2012-08-16
Information query
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