Invention Grant
- Patent Title: Optimized process for fabricating light-emitting devices using artificial materials
- Patent Title (中): 使用人造材料制造发光器件的优化方法
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Application No.: US12666068Application Date: 2008-06-11
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Publication No.: US08685771B2Publication Date: 2014-04-01
- Inventor: Mane-Si Laure Lee-Bouhours , Michel Garcia , Shailendra Bansropun , Brigitte Loiseaux
- Applicant: Mane-Si Laure Lee-Bouhours , Michel Garcia , Shailendra Bansropun , Brigitte Loiseaux
- Applicant Address: FR Neuilly sur Seine
- Assignee: Thales
- Current Assignee: Thales
- Current Assignee Address: FR Neuilly sur Seine
- Agency: LaRiviere, Grubman & Payne, LLP
- Priority: FR0704503 20070622
- International Application: PCT/EP2008/057254 WO 20080611
- International Announcement: WO2009/000645 WO 20081231
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
The present invention relates to a process for fabricating light-emitting device. More particularly, the aim of the invention is to allow the fabricating of light emitters with improved efficiency by using artificial materials, enabling antireflection or high-reflectivity treatments to be carried out. For this purpose, subwavelength structures are etched on one of the ends of an emissive cavity, enabling external face to be controlled. The invention applies to any light emitter, and therefore notably to lasers and more particularly still to QCLs (quantum cascade lasers). Moreover, the fabrication process according to the invention is preferably a wafer-scale process.
Public/Granted literature
- US20100291717A1 OPTIMIZED PROCESS FOR FABRICATING LIGHT-EMITTING DEVICES USING ARTIFICIAL MATERIALS Public/Granted day:2010-11-18
Information query
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