Invention Grant
- Patent Title: Semi-transparent film grayscale mask
- Patent Title (中): 半透明胶片灰度面膜
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Application No.: US11950196Application Date: 2007-12-04
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Publication No.: US08685596B2Publication Date: 2014-04-01
- Inventor: Wei Gao , Bruce D. Ulrich , Yoshi Ono
- Applicant: Wei Gao , Bruce D. Ulrich , Yoshi Ono
- Applicant Address: US WA Camas
- Assignee: Sharp Laboratories of America, Inc.
- Current Assignee: Sharp Laboratories of America, Inc.
- Current Assignee Address: US WA Camas
- Agency: Law Office of Gerald Maliszewski
- Agent Gerald Maliszewski
- Main IPC: G03F1/00
- IPC: G03F1/00

Abstract:
A grayscale mask made from semi-transparent film layers is provided, along with an associated fabrication method. The method provides a transparent substrate, such as quartz, with a surface. A first layer of a semi-transparent film having a surface with a first surface area, is formed overlying the substrate surface. At least a second layer of the semi-transparent film having a surface with a second surface area greater than the first surface area, is formed overlying the first layer. A first vertical region is formed having a light first attenuation parameter through the combination of substrate, first layer, and second layer. A second vertical region is formed having a light second attenuation parameter through the combination of the first layer and substrate, and a third vertical region is formed having a light third attenuation parameter through the substrate.
Public/Granted literature
- US20090142673A1 SEMI-TRANSPARENT FILM GRAYSCALE MASK Public/Granted day:2009-06-04
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