Invention Grant
US08684996B2 Method and apparatus for setting a basal rate profile for an insulin pump
有权
用于设置胰岛素泵的基础速率曲线的方法和装置
- Patent Title: Method and apparatus for setting a basal rate profile for an insulin pump
- Patent Title (中): 用于设置胰岛素泵的基础速率曲线的方法和装置
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Application No.: US13038635Application Date: 2011-03-02
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Publication No.: US08684996B2Publication Date: 2014-04-01
- Inventor: Ulrich Haueter , Daniel Von Buren , Catalin Cris , Stephan Marcin
- Applicant: Ulrich Haueter , Daniel Von Buren , Catalin Cris , Stephan Marcin
- Applicant Address: CH Rotkreuz
- Assignee: Roche Diagnostics International AG
- Current Assignee: Roche Diagnostics International AG
- Current Assignee Address: CH Rotkreuz
- Agency: Dinsmore & Shohl LLP
- Priority: EP08015448 20080902
- Main IPC: A61M31/00
- IPC: A61M31/00 ; A61K9/22 ; A61M37/00

Abstract:
Methods for setting a basal rate profile for an insulin pump, wherein the basal rate profile defines a basal rate delivery for a selected time interval and has a pre-defined number of profile segments each of which define the basal rate delivery for a subset of the selected time interval, include providing a curve representing the basal rate as a continuous function of time as an input for an input unit and generating the basal rate profile from the curve by a calculation unit by assigning curve values at selected time instances to the pre-defined number of profile segments.
Public/Granted literature
- US20120059348A1 Method and Apparatus For Setting A Basal Rate Profile For An Insulin Pump Public/Granted day:2012-03-08
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