Invention Grant
- Patent Title: Micro electro mechanical system
- Patent Title (中): 微机电系统
-
Application No.: US13058862Application Date: 2009-08-05
-
Publication No.: US08683864B2Publication Date: 2014-04-01
- Inventor: Munenori Degawa , Heewon Jeong
- Applicant: Munenori Degawa , Heewon Jeong
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JP2008-209786 20080818
- International Application: PCT/JP2009/063855 WO 20090805
- International Announcement: WO2010/021242 WO 20100225
- Main IPC: G01P15/125
- IPC: G01P15/125 ; G01C19/56

Abstract:
In order to provide a technology capable of suppressing degradation of measurement accuracy due to fluctuation of detection sensitivity of an MEMS by suppressing fluctuation in natural frequency of the MEMS caused by a stress, first, fixed portions 3a to 3d are displaced outward in a y-direction of a semiconductor substrate 2 by deformation of the semiconductor substrate 2. Since a movable body 5 is disposed in a state of floating above the semiconductor substrate 2, it is not affected and displaced by the deformation of the semiconductor substrate 2. Therefore, a tensile stress (+σ1) occurs in the beam 4a and a compressive stress (−σ2) occurs in the beam 4b. At this time, in terms of a spring system made by combining the beam 4a and the beam 4b, increase in spring constant due to the tensile stress acting on the beam 4a and decrease in spring constant due to the compressive stress acting on the beam 4b are offset against each other.
Public/Granted literature
- US20110138912A1 MICRO ELECTRO MECHANICAL SYSTEM Public/Granted day:2011-06-16
Information query
IPC分类: