An alignment metrology and resolution measurement system concurrently determines the alignment of an imaging array in six degrees of freedom relative to an external reference frame, and further determines the resolution of the imaging array. To achieve this, an image of at least three mask patterns is projected on the imaging array. First and second positions of the imaging array relative to first and second coordinate axis of the reference frame is obtained using pixel positions of the images along the first and second axis. A first rotational position of the imaging array about a third coordinate axis is obtained using pixel positions of the images along the first and second axes. The third position and the second and third rotational positions of the imaging array about the first and second coordinate axis are determined using feature widths of focus images of the patterns and distances between the mask patterns.