Invention Grant
- Patent Title: Method for automated determination of an optimally parameterized scatterometry model
- Patent Title (中): 自动确定最佳参数化散射测量模型的方法
-
Application No.: US12841932Application Date: 2010-07-22
-
Publication No.: US08666703B2Publication Date: 2014-03-04
- Inventor: Jason Ferns , John J. Hench , Serguei Komarov , Thaddeus Dziura
- Applicant: Jason Ferns , John J. Hench , Serguei Komarov , Thaddeus Dziura
- Applicant Address: JP Tokyo US CA Milpitas
- Assignee: Tokyo Electron Limited,KLA-Tencor Corporation
- Current Assignee: Tokyo Electron Limited,KLA-Tencor Corporation
- Current Assignee Address: JP Tokyo US CA Milpitas
- Agency: Blakely Sokoloff Taylor & Zafman LLP
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06F17/10 ; G06G7/48 ; H03F1/26 ; G06F19/00

Abstract:
Provided is an automated determination of an optimized parameterization of a scatterometry model for analysis of a sample diffracting structure having unknown parameters. A preprocessor determines from a plurality of floating model parameters, a reduced set of model parameters which can be reasonably floated in the scatterometry model based on a relative precision for each parameter determined from the Jacobian of measured spectral information with respect to each parameter. The relative precision for each parameter is determined in a manner which accounts for correlation between the parameters for a combination.
Public/Granted literature
- US20120022836A1 METHOD FOR AUTOMATED DETERMINATION OF AN OPTIMALLY PARAMETERIZED SCATTEROMETRY MODEL Public/Granted day:2012-01-26
Information query