Invention Grant
- Patent Title: Method and system for controlling a manufacturing process
- Patent Title (中): 用于控制制造过程的方法和系统
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Application No.: US12678148Application Date: 2008-07-22
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Publication No.: US08666532B2Publication Date: 2014-03-04
- Inventor: Rafi Amit
- Applicant: Rafi Amit
- Applicant Address: IL Migdal Haemek
- Assignee: Camtek Ltd.
- Current Assignee: Camtek Ltd.
- Current Assignee Address: IL Migdal Haemek
- Agent Oren Reches
- International Application: PCT/IL2008/001011 WO 20080722
- International Announcement: WO2009/013741 WO 20090129
- Main IPC: G07F7/02
- IPC: G07F7/02

Abstract:
A method, system and computer program product for controlling a manufacturing process of an electronic circuit, the method includes: calculating at least one layer misalignment between layers of an electrical circuit that are expected to be mutually aligned; wherein the layers are manufactured by at least a direct imaging device that exposes a photo-resistive material to radiation to provide a pattern; selecting, in response to the at least one layer misalignment and in response to at least one allowable misalignment threshold, a selected response out of: manufacturing at least one additional layer of the electrical circuit; and stopping the manufacturing process of the electrical circuit; and participating in executing the selected response.
Public/Granted literature
- US20110029121A1 METHOD AND SYSTEM FOR CONTROLLING A MANUFACTURING PROCESS Public/Granted day:2011-02-03
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