Invention Grant
US08664726B2 Electrostatic discharge (ESD) protection device, method of fabricating the device, and electronic apparatus including the device
有权
静电放电(ESD)保护装置,制造该装置的方法和包括该装置的电子设备
- Patent Title: Electrostatic discharge (ESD) protection device, method of fabricating the device, and electronic apparatus including the device
- Patent Title (中): 静电放电(ESD)保护装置,制造该装置的方法和包括该装置的电子设备
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Application No.: US13041693Application Date: 2011-03-07
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Publication No.: US08664726B2Publication Date: 2014-03-04
- Inventor: Dong-ryul Chang , Oh-kyunm Kwon
- Applicant: Dong-ryul Chang , Oh-kyunm Kwon
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Volentine & Whitt, PLLC
- Priority: KR10-2010-0080408 20100819
- Main IPC: H01L23/62
- IPC: H01L23/62

Abstract:
An electrostatic discharge (ESD) device includes a substrate, an external well of a first conductivity type in the substrate, and an internal well of a second conductivity type in the external well, the first conductivity type opposite the second conductivity type. The ESD device further includes a first heavily doped region of the first conductivity type located at a surface of the internal well, a second heavily doped region of the second conductivity type located at a surface of the internal well, and a third heavily doped region of the first conductivity type located at a surface of the external well. The second heavily doped region is interposed between and spaced from each of the first and third heavily doped regions, and at least one of a space between the first and second heavily doped regions and a space between the second and third heavily doped regions is devoid of a device isolation structure of electrical isolation material.
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