Invention Grant
US08664665B2 Schottky diode employing recesses for elements of junction barrier array
有权
肖特基二极管采用连接屏障阵列元件的凹槽
- Patent Title: Schottky diode employing recesses for elements of junction barrier array
- Patent Title (中): 肖特基二极管采用连接屏障阵列元件的凹槽
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Application No.: US13229752Application Date: 2011-09-11
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Publication No.: US08664665B2Publication Date: 2014-03-04
- Inventor: Jason Patrick Henning , Qingchun Zhang , Sei-Hyung Ryu , Anant Agarwal , John Williams Palmour , Scott Allen
- Applicant: Jason Patrick Henning , Qingchun Zhang , Sei-Hyung Ryu , Anant Agarwal , John Williams Palmour , Scott Allen
- Applicant Address: US NC Durham
- Assignee: Cree, Inc.
- Current Assignee: Cree, Inc.
- Current Assignee Address: US NC Durham
- Agency: Withrow & Terranova, P.L.L.C.
- Main IPC: H01L29/15
- IPC: H01L29/15

Abstract:
The present disclosure generally relates to a Schottky diode that has a substrate, a drift layer provided over the substrate, and a Schottky layer provided over an active region of the substrate. A junction barrier array is provided in the drift layer just below the Schottky layer. The elements of the junction barrier array are generally doped regions in the drift layer. To increase the depth of these doped regions, individual recesses may be formed in the surface of the drift layer where the elements of the junction barrier array are to be formed. Once the recesses are formed in the drift layer, areas about and at the bottom of the recesses are doped to form the respective elements of the junction barrier array.
Public/Granted literature
- US20130062620A1 SCHOTTKY DIODE EMPLOYING RECESSES FOR ELEMENTS OF JUNCTION BARRIER ARRAY Public/Granted day:2013-03-14
Information query
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