Invention Grant
- Patent Title: Deposition apparatus and electronic device manufacturing method
- Patent Title (中): 沉积装置和电子装置的制造方法
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Application No.: US12781903Application Date: 2010-05-18
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Publication No.: US08663437B2Publication Date: 2014-03-04
- Inventor: Nobuo Yamaguchi , Kimiko Mashimo , Shinya Nagasawa
- Applicant: Nobuo Yamaguchi , Kimiko Mashimo , Shinya Nagasawa
- Applicant Address: JP Kawasaki-Shi
- Assignee: Canon Anelva Corporation
- Current Assignee: Canon Anelva Corporation
- Current Assignee Address: JP Kawasaki-Shi
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2008-305567 20081128
- Main IPC: C23C14/00
- IPC: C23C14/00 ; C25B9/00 ; C25B11/00 ; C25B13/00 ; C23C16/00

Abstract:
A deposition apparatus includes a shutter storage unit which is connected to a processing chamber via an opening and stores a shutter in the retracted state into an exhaust chamber, and a shield member which is formed around the opening of the shutter storage unit and covers the exhaust port of the exhaust chamber. The shield member has, at a position of a predetermined height between the opening of the shutter storage unit and a deposition unit, the first exhaust path which communicates with the exhaust port of the exhaust chamber.
Public/Granted literature
- US20100224482A1 DEPOSITION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD Public/Granted day:2010-09-09
Information query
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