Invention Grant
US08663437B2 Deposition apparatus and electronic device manufacturing method 有权
沉积装置和电子装置的制造方法

Deposition apparatus and electronic device manufacturing method
Abstract:
A deposition apparatus includes a shutter storage unit which is connected to a processing chamber via an opening and stores a shutter in the retracted state into an exhaust chamber, and a shield member which is formed around the opening of the shutter storage unit and covers the exhaust port of the exhaust chamber. The shield member has, at a position of a predetermined height between the opening of the shutter storage unit and a deposition unit, the first exhaust path which communicates with the exhaust port of the exhaust chamber.
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