Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US13462427Application Date: 2012-05-02
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Publication No.: US08643074B2Publication Date: 2014-02-04
- Inventor: Chih-Yang Pai , Kuo-Chi Tu , Wen-Chuan Chiang , Chung-Yen Chou
- Applicant: Chih-Yang Pai , Kuo-Chi Tu , Wen-Chuan Chiang , Chung-Yen Chou
- Applicant Address: TW
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW
- Agency: Lowe Hauptman & Ham, LLP
- Main IPC: H01L27/108
- IPC: H01L27/108

Abstract:
A semiconductor device includes a semiconductor substrate, an isolation structure disposed in the semiconductor substrate, a conductive layer disposed over the isolation structure, a capacitor disposed over the isolation structure, the capacitor including a top electrode, a bottom electrode, and a dielectric disposed between the top electrode and the bottom electrode, and a first contact electrically coupling the conductive layer and the bottom electrode, the bottom electrode substantially engaging the first contact on at least two faces.
Public/Granted literature
- US20130292794A1 SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING Public/Granted day:2013-11-07
Information query
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