Invention Grant
- Patent Title: Integrated snubber in a single poly MOSFET
- Patent Title (中): 集成缓冲器在单个多晶硅MOSFET中
-
Application No.: US13517770Application Date: 2012-06-14
-
Publication No.: US08643071B2Publication Date: 2014-02-04
- Inventor: Ji Pan , Daniel Ng , Anup Bhalla
- Applicant: Ji Pan , Daniel Ng , Anup Bhalla
- Applicant Address: US CA Sunnyvale
- Assignee: Alpha and Omega Semiconductor Incorporated
- Current Assignee: Alpha and Omega Semiconductor Incorporated
- Current Assignee Address: US CA Sunnyvale
- Agency: JDI Patent
- Agent Joshua D. Isenberg
- Main IPC: H01L29/76
- IPC: H01L29/76

Abstract:
A MOSFET device includes one or more active device structures and one or more dummy structures formed from semiconductor drift region and body regions. The dummy structures are electrically connected in parallel to the active device structures. Each dummy structure includes an electrically insulated snubber electrode formed proximate the body region and the drift region, an insulator portion formed over the snubber electrode and a top surface of the body region, and one or more electrical connections between the snubber electrode and portions of the body region and a source electrode. It is emphasized that this abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
Public/Granted literature
- US20130334599A1 INTEGRATED SNUBBER IN A SINGLE POLY MOSFET Public/Granted day:2013-12-19
Information query
IPC分类: