Invention Grant
- Patent Title: Ceramic coating deposition
- Patent Title (中): 陶瓷涂层沉积
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Application No.: US13043948Application Date: 2011-03-09
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Publication No.: US08642140B2Publication Date: 2014-02-04
- Inventor: Igor V. Belousov , Yuriy G. Kononenko , Anatoly Kuzmichev , Leonid Shaginyan , Michael J. Maloney , John F. Mullooly, Jr.
- Applicant: Igor V. Belousov , Yuriy G. Kononenko , Anatoly Kuzmichev , Leonid Shaginyan , Michael J. Maloney , John F. Mullooly, Jr.
- Applicant Address: US CT Hartford
- Assignee: United Technologies Corporation
- Current Assignee: United Technologies Corporation
- Current Assignee Address: US CT Hartford
- Agency: Bachman & LaPointe, P.C.
- Main IPC: H05H1/24
- IPC: H05H1/24

Abstract:
A material is applied to a part. The part is placed in a deposition chamber and a first electric potential is applied to the part. Components are evaporated for forming the material. The evaporated components are ionized. The first electric potential is modulated so as to draw the ionized component to the part. The modulation comprises a plurality of first steps for PA-PVD. Each of the first steps comprises a series of pulses of negative potential. The modulation further comprises a plurality of second steps for PVD alternating with the first steps.
Public/Granted literature
- US20120231173A1 Ceramic Coating Deposition Public/Granted day:2012-09-13
Information query
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