Invention Grant
US08527917B2 Semiconductor cell for photomask data verification and semiconductor chip
失效
用于光掩模数据验证和半导体芯片的半导体电池
- Patent Title: Semiconductor cell for photomask data verification and semiconductor chip
- Patent Title (中): 用于光掩模数据验证和半导体芯片的半导体电池
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Application No.: US12358770Application Date: 2009-01-23
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Publication No.: US08527917B2Publication Date: 2013-09-03
- Inventor: Takayasu Hirai
- Applicant: Takayasu Hirai
- Applicant Address: JP Tokyo
- Assignee: Ricoh Company, Ltd.
- Current Assignee: Ricoh Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Dickstein Shapiro LLP
- Priority: JP2008-015482 20080125
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A semiconductor cell for photomask data verification is disclosed that is provided in a semiconductor chip having a semiconductor integrated circuit and used for verifying photomask data of the semiconductor chip obtained by performing arithmetic processing on layout data of the semiconductor integrated circuit. The semiconductor cell for photomask data verification has the photomask data obtained by performing the arithmetic processing on the layout data of the semiconductor integrated circuit and is electrically separated from the semiconductor integrated circuit.
Public/Granted literature
- US20090193386A1 SEMICONDUCTOR CELL FOR PHOTOMASK DATA VERIFICATION AND SEMICONDUCTOR CHIP Public/Granted day:2009-07-30
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