Invention Grant
- Patent Title: Chamber apparatus, extreme ultraviolet light generation system, and method for controlling the extreme ultraviolet light generation system
- Patent Title (中): 室内设备,极紫外光发生系统以及用于控制极紫外光发生系统的方法
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Application No.: US13494466Application Date: 2012-06-12
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Publication No.: US08525140B2Publication Date: 2013-09-03
- Inventor: Tooru Abe , Osamu Wakabayashi
- Applicant: Tooru Abe , Osamu Wakabayashi
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: McDermott Will & Emery LLP
- Priority: JP2011-164290 20110727
- Main IPC: G21K5/00
- IPC: G21K5/00 ; G21K5/10 ; H05G2/00 ; G03F7/20

Abstract:
A chamber apparatus for operating with a laser apparatus includes a chamber, a target supply unit, a first optical system and a second optical system. The chamber has an inlet for introducing a laser beam thereinto. The target supply unit supplies a target material to a region inside the chamber. The first optical system focuses the laser beam in the region. The guide beam output device outputs a guide beam. The second optical system directs the guide beam such that an axis of a beam path of the guide beam substantially coincides with an axis of a beam path of the laser beam and such that the guide beam enters the focusing optical system through the region.
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