Invention Grant
US08524099B2 Methods for accessing a process chamber using a dual zone gas injector with improved optical access
有权
使用具有改进的光学访问的双区域气体注入器访问处理室的方法
- Patent Title: Methods for accessing a process chamber using a dual zone gas injector with improved optical access
- Patent Title (中): 使用具有改进的光学访问的双区域气体注入器访问处理室的方法
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Application No.: US12987030Application Date: 2011-01-07
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Publication No.: US08524099B2Publication Date: 2013-09-03
- Inventor: Jeff A. Bogart , Leonard Sharpless , Harmeet Singh
- Applicant: Jeff A. Bogart , Leonard Sharpless , Harmeet Singh
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Martine Penilla Group LLP
- Main IPC: G01L21/30
- IPC: G01L21/30

Abstract:
Methods for processing events occurring in a process chamber are provided. In one method, an operation includes carrying gas and receiving an optical signal from the process chamber to an analysis tool that operates in response to the optical signal having a signal-to-noise ratio (SNR) for process analysis. And, dividing the carried gas and optical signal into a plurality of separate gas and optical signals between the process chamber and the analysis tool. The dividing is configured through separate apertures so that the apertures collectively maintain the SNR of the optical signal received at the tool. Methods provide a septum in a second bore dividing the second bore into apertures configured to reduce etching of and deposition on the optical access window and to maintain the desired SNR at the diagnostic end point.
Public/Granted literature
- US20110103805A1 Methods for Accessing a Process Chamber Using a Dual Zone Gas Injector with Improved Optical Access Public/Granted day:2011-05-05
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