Invention Grant
- Patent Title: Surface position detecting apparatus, exposure apparatus, surface position detecting method, and device manufacturing method
- Patent Title (中): 表面位置检测装置,曝光装置,表面位置检测方法和装置制造方法
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Application No.: US12540064Application Date: 2009-08-12
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Publication No.: US08502978B2Publication Date: 2013-08-06
- Inventor: Yasuhiro Hidaka
- Applicant: Yasuhiro Hidaka
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Main IPC: G01B11/00
- IPC: G01B11/00 ; G01B11/14

Abstract:
A surface position detecting apparatus according to an aspect of the present invention has a light-sending optical system which makes first light and second light from first and second patterns incident at different incidence angles to a predetermined surface to project an intermediate image of the first pattern and an intermediate image of the second pattern onto the predetermined surface; a light-receiving optical system which guides the first light and the second light reflected by the predetermined surface, to a first observation surface and to a second observation surface, respectively, to form an observation image of the first pattern and an observation image of the second pattern on the first and second observation surfaces; and a detecting section which detects a piece of position information of the observation image of the first pattern and a piece of position information of the observation image of the second pattern and calculates a surface position of the predetermined surface, based on the pieces of position information. The light-sending optical system has a sending-side reflecting section which reflects the second light having passed via sending-side common optical members, an even number of times to make the second light incident at the incidence angle smaller than that of the first light to the predetermined surface.
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