Invention Grant
US08501052B2 Thin film comprising titanium oxide as main component and sintered compact sputtering target comprising titanium oxide as main component 有权
作为主要成分的以氧化钛为主要成分的薄膜,以氧化钛为主要成分的烧结微型溅射靶

Thin film comprising titanium oxide as main component and sintered compact sputtering target comprising titanium oxide as main component
Abstract:
A thin film comprising titanium oxide as its main component, wherein the thin film includes titanium, oxygen and copper, content of Ti is 29.0 at % or higher and 34.0 at % or less and content of Cu is 0.003 at % or higher and 7.7 at % or less with remainder being oxygen and unavoidable impurities, and ratio of oxygen component to metal components, O/(2Ti+0.5Cu), is 0.96 or higher. This invention aims to obtain a thin film comprising titanium oxide as its main component with a high refractive index and low extinction coefficient and a sintered compact sputtering target comprising titanium oxide as its main component which is suitable for producing the foregoing thin film, to obtain a thin film with superior transmittance and low reflectance and which is effective as an interference film or protective film of an optical information recording medium, and to obtain a thin film that can be applied to a glass substrate; that is, a thin film that can be used as a heat ray reflective film, antireflection film, and interference filter.
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