Invention Grant
- Patent Title: Method for making three-dimensional nano-structure array
- Patent Title (中): 制备三维纳米结构阵列的方法
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Application No.: US12969998Application Date: 2010-12-16
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Publication No.: US08501020B2Publication Date: 2013-08-06
- Inventor: Zhen-Dong Zhu , Qun-Qing Li , Shou-Shan Fan
- Applicant: Zhen-Dong Zhu , Qun-Qing Li , Shou-Shan Fan
- Applicant Address: CN Beijing TW New Taipei
- Assignee: Tsinghua University,Hon Hai Precision Industry Co., Ltd.
- Current Assignee: Tsinghua University,Hon Hai Precision Industry Co., Ltd.
- Current Assignee Address: CN Beijing TW New Taipei
- Agency: Altis Law Group, Inc.
- Priority: CN201010184792 20100527
- Main IPC: B44C1/22
- IPC: B44C1/22 ; B82Y40/00
Abstract:
A method for making a three-dimensional nano-structure array includes following steps. First, a substrate is provided. Next, a mask is formed on the substrate. The mask is a monolayer nanosphere array or a film defining a number of holes arranged in an array. The mask is then tailored and simultaneously the substrate is etched by the mask. Lastly, the mask is removed.
Public/Granted literature
- US20110294295A1 METHOD FOR MAKING THREE-DIMENSIONAL NANO-STRUCTURE ARRAY Public/Granted day:2011-12-01
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