Invention Grant
- Patent Title: Rotatable sputtering magnetron with high stiffness
- Patent Title (中): 具有高刚度的可旋转溅射磁控管
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Application No.: US12992020Application Date: 2009-05-06
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Publication No.: US08500976B2Publication Date: 2013-08-06
- Inventor: Parsifal Goderis , Ivan Van De Putte
- Applicant: Parsifal Goderis , Ivan Van De Putte
- Applicant Address: BE Deinze
- Assignee: Soleras Advanced Coatings BVBA
- Current Assignee: Soleras Advanced Coatings BVBA
- Current Assignee Address: BE Deinze
- Agency: Foley & Lardner LLP
- Priority: EP08156347 20080516
- International Application: PCT/EP2009/055486 WO 20090506
- International Announcement: WO2009/138348 WO 20091119
- Main IPC: C23C14/35
- IPC: C23C14/35

Abstract:
A sputtering magnetron (300) insertable in a rotatable target is described. The magnetron is designed around a single piece, multiwalled tube (102, 202) with compartments (316, 316′, 318, 318′) extending over the length of the tube. The multiwalled tube gives a much stiffer magnetron carrier structure compared to prior art magnetrons. As a result, the magnetic field generator can be mounted inside a compartment and the distance between magnets and target surface is easily adjustable as the tube is much stiffer than the generator. Additionally, the coolant channels can be incorporated inside the tube and close to the outer wall of the tube so that coolant can be supplied in the vicinity of the magnetic field generator. The increased stiffness of the magnetron allows the target tube to be carried by the magnetron—not the other way around—at least during part of the useful life of the target. As a result thin target carrier tubes can be used as they don't have to carry the magnetron anymore resulting in a longer use of the target.
Public/Granted literature
- US20110062022A1 ROTATABLE SPUTTERING MAGNETRON WITH HIGH STIFFNESS Public/Granted day:2011-03-17
Information query
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