Invention Grant
- Patent Title: Deplating contacts in an electrochemical plating apparatus
- Patent Title (中): 在电化学电镀设备中脱落接触
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Application No.: US12856357Application Date: 2010-08-13
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Publication No.: US08500968B2Publication Date: 2013-08-06
- Inventor: Daniel J. Woodruff , Nolan L. Zimmerman , John L. Klocke , Klaus H. Pfeifer , Kyle M. Hanson , Matthew Herset
- Applicant: Daniel J. Woodruff , Nolan L. Zimmerman , John L. Klocke , Klaus H. Pfeifer , Kyle M. Hanson , Matthew Herset
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Perkins Coie LLP
- Main IPC: C25D17/00
- IPC: C25D17/00

Abstract:
An electroplating apparatus having improved contact deplating features includes a bowl assembly having a bowl for holding an electroplating solution. A head having a rotor including a contact ring and a head motor for rotating the rotor cooperates with the bowl assembly during plating operations. A lift/rotate actuator may be used to move the head to position a sector of the contact ring in a ring slot or opening of a deplating module. Since the deplating is performed within the deplating module, and not within the bowl assembly, the electroplating solution in the bowl assembly is not affected by the deplating process.
Public/Granted literature
- US20120037495A1 DEPLATING CONTACTS IN AN ELECTROCHEMICAL PLATING APPARATUS Public/Granted day:2012-02-16
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