Invention Grant
US08500928B2 Sputter targets and methods of forming same by rotary axial forging
有权
溅射靶和通过旋转轴向锻造成型的方法
- Patent Title: Sputter targets and methods of forming same by rotary axial forging
- Patent Title (中): 溅射靶和通过旋转轴向锻造成型的方法
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Application No.: US13551697Application Date: 2012-07-18
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Publication No.: US08500928B2Publication Date: 2013-08-06
- Inventor: John P. Matera , Robert B. Ford , Charles E. Wickersham, Jr.
- Applicant: John P. Matera , Robert B. Ford , Charles E. Wickersham, Jr.
- Applicant Address: US MA Waltham
- Assignee: Global Advanced Metals, USA, Inc.
- Current Assignee: Global Advanced Metals, USA, Inc.
- Current Assignee Address: US MA Waltham
- Agency: Kilyk & Bowersox, P.L.L.C.
- Main IPC: C22F1/18
- IPC: C22F1/18 ; C22F1/04 ; C22F1/14 ; C22F1/08 ; C22C14/00 ; C22C27/02 ; C22C9/00 ; C22C21/00
Abstract:
A method of making sputter targets using rotary axial forging is described. Other thermomechanical working steps can be used prior to and/or after the forging step. Sputter targets are further described which can have unique grain size and/or crystal structures.
Public/Granted literature
- US20120297855A1 Sputter Targets And Methods Of Forming Same By Rotary Axial Forging Public/Granted day:2012-11-29
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