Invention Grant
US08500248B2 Method of manufacturing nozzle plate, liquid ejection head and image forming apparatus
有权
制造喷嘴板,液体喷射头和图像形成装置的方法
- Patent Title: Method of manufacturing nozzle plate, liquid ejection head and image forming apparatus
- Patent Title (中): 制造喷嘴板,液体喷射头和图像形成装置的方法
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Application No.: US13238802Application Date: 2011-09-21
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Publication No.: US08500248B2Publication Date: 2013-08-06
- Inventor: Shuji Takahashi
- Applicant: Shuji Takahashi
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2006-081129 20060323
- Main IPC: B41J2/14
- IPC: B41J2/14 ; G01D15/00 ; G11B5/127

Abstract:
The method of manufacturing a nozzle plate which includes a nozzle having a tapered section and a linear section includes the steps of: forming an etching stopper layer for stopping dry etching of a silicon substrate, on a first surface of the silicon substrate; forming a mask layer on a second surface of the silicon substrate reverse to the first surface; performing a first patterning process with respect to the mask layer so that an opening section is formed in the mask layer; carrying out the dry etching of the silicon substrate through the opening section in the mask layer so that the tapered section of the nozzle is formed in the silicon substrate; carrying out dry etching of the etching stopper layer through the opening section in the mask layer so that at least a part of the linear section of the nozzle is formed in the etching stopper layer; and removing the mask layer.
Public/Granted literature
- US20120007920A1 METHOD OF MANUFACTURING NOZZLE PLATE, LIQUID EJECTION HEAD AND IMAGE FORMING APPARATUS Public/Granted day:2012-01-12
Information query
IPC分类: