Invention Grant
US08482304B2 Sensing element integrating silicon nanowire gated-diodes, manufacturing method and detecting system thereof
有权
集成硅纳米线门控二极管的感应元件,其制造方法和检测系统
- Patent Title: Sensing element integrating silicon nanowire gated-diodes, manufacturing method and detecting system thereof
- Patent Title (中): 集成硅纳米线门控二极管的感应元件,其制造方法和检测系统
-
Application No.: US12655109Application Date: 2009-12-23
-
Publication No.: US08482304B2Publication Date: 2013-07-09
- Inventor: Jeng-Tzong Sheu , Chen-Chia Chen
- Applicant: Jeng-Tzong Sheu , Chen-Chia Chen
- Applicant Address: TW Hsinchu
- Assignee: National Chiao Tung University
- Current Assignee: National Chiao Tung University
- Current Assignee Address: TW Hsinchu
- Agency: Hudak, Shunk & Farine Co. LPA
- Priority: TW098120307 20090617
- Main IPC: G01R27/08
- IPC: G01R27/08

Abstract:
The invention disclosed a sensing element integrating silicon nanowire gated-diodes with microfluidic channel, a manufacturing method and a detecting system thereof. The sensing element integrating silicon nanowire gated-diodes with a microfluidic channel includes a silicon nanowire gated-diode, a plurality of reference electrodes, a passivation layer and a microfluidic channel. The reference electrodes are formed on the silicon nanowire gated-diodes, and the passivation layer having a surface decorated with chemical materials is used for covering the silicon nanowire gated-diodes, and the microfluidic channel is connected with the passivation layer. When a detecting sample is connected or absorbed on the surface of the passivation layer, the sensing element integrating silicon nanowire gated-diodes with the microfluidic channel can detect an electrical signal change.
Public/Granted literature
Information query