Invention Grant
US08482304B2 Sensing element integrating silicon nanowire gated-diodes, manufacturing method and detecting system thereof 有权
集成硅纳米线门控二极管的感应元件,其制造方法和检测系统

Sensing element integrating silicon nanowire gated-diodes, manufacturing method and detecting system thereof
Abstract:
The invention disclosed a sensing element integrating silicon nanowire gated-diodes with microfluidic channel, a manufacturing method and a detecting system thereof. The sensing element integrating silicon nanowire gated-diodes with a microfluidic channel includes a silicon nanowire gated-diode, a plurality of reference electrodes, a passivation layer and a microfluidic channel. The reference electrodes are formed on the silicon nanowire gated-diodes, and the passivation layer having a surface decorated with chemical materials is used for covering the silicon nanowire gated-diodes, and the microfluidic channel is connected with the passivation layer. When a detecting sample is connected or absorbed on the surface of the passivation layer, the sensing element integrating silicon nanowire gated-diodes with the microfluidic channel can detect an electrical signal change.
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