Invention Grant
- Patent Title: Semiconductor laser device and method for producing the same
- Patent Title (中): 半导体激光装置及其制造方法
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Application No.: US13267080Application Date: 2011-10-06
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Publication No.: US08477820B2Publication Date: 2013-07-02
- Inventor: Yutaka Onishi
- Applicant: Yutaka Onishi
- Applicant Address: JP Osaka
- Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee Address: JP Osaka
- Agency: Smith, Gambrell & Russell, LLP
- Priority: JP2010-233865 20101018
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
A semiconductor laser device includes a first semiconductor stack portion that includes a grating layer and an active layer provided on the grating layer. The grating layer has a first region and second region; a diffraction grating provided in the first region; a semiconductor ridge structure portion provided on the first semiconductor stack portion and extending in a first direction; and a pair of first trenches provided along both side faces of the semiconductor ridge structure portion with the first region of the grating layer being located between the trenches. The first trenches penetrate through the grating layer. The first region of the grating layer has an end extending in a second direction intersecting with the first direction. The end of the first region of the grating layer reaches a trench.
Public/Granted literature
- US20120093190A1 SEMICONDUCTOR LASER DEVICE AND METHOD FOR PRODUCING THE SAME Public/Granted day:2012-04-19
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