Invention Grant
US08476466B2 Method for making harmful compound harmless and method for producing organic semiconductor element compound
有权
使有害化合物无害化的方法和生产有机半导体元素化合物的方法
- Patent Title: Method for making harmful compound harmless and method for producing organic semiconductor element compound
- Patent Title (中): 使有害化合物无害化的方法和生产有机半导体元素化合物的方法
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Application No.: US13120377Application Date: 2009-11-02
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Publication No.: US08476466B2Publication Date: 2013-07-02
- Inventor: Koichiro Nakamura
- Applicant: Koichiro Nakamura
- Applicant Address: JP Tokyo
- Assignee: Nippon Sheet Glass Company, Limited
- Current Assignee: Nippon Sheet Glass Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Hamre, Schumann, Mueller & Larson, P.C.
- Priority: JP2008-285882 20081106
- International Application: PCT/JP2009/068777 WO 20091102
- International Announcement: WO2010/053072 WO 20100514
- Main IPC: C07F9/00
- IPC: C07F9/00 ; C07C391/00
Abstract:
The present invention provides a method for making a harmful arsenic compound, antimony compound and selenium compound harmless by using an organic cobalt complex, in which the cost of the method can be improved. The present invention is a method for making a harmful compound harmless, including irradiating light to an organic cobalt complex containing cobalt as a central metal and a corrin ring as a ligand, a methyl group donor, a titanium oxide photocatalyst, and a harmful compound containing an arsenic atom, an antimony atom or a selenium atom to methylate the harmful compound. In the present invention, it is preferable that the harmful compound be trimethylated.
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