Invention Grant
- Patent Title: Photosensitive resin composition and preparation method
- Patent Title (中): 光敏树脂组合物及其制备方法
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Application No.: US12954033Application Date: 2010-11-24
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Publication No.: US08476331B2Publication Date: 2013-07-02
- Inventor: Jiuxia Yang
- Applicant: Jiuxia Yang
- Applicant Address: CN Beijing
- Assignee: Boe Technology Group Co., Ltd.
- Current Assignee: Boe Technology Group Co., Ltd.
- Current Assignee Address: CN Beijing
- Agency: Ladas & Parry LLP
- Priority: CN200910241576 20091126
- Main IPC: C08L63/00
- IPC: C08L63/00 ; C08K3/00 ; C08G59/00 ; B32B27/18 ; B32B27/20 ; B32B27/38
Abstract:
A photosensitive resin composition comprises: 0.01 wt %-10 wt % of reflective particles; 0 wt %-12 wt % of pigment; 1 wt %-10 wt % of dispersant; 1.5 wt %-5 wt % of dispersion resin; 2 wt %-25 wt % of optically active polymer; 1 wt %-22 wt % of optical active monomer; 0.4 wt %-5 wt % of epoxy resin; 5 wt %-85 wt % of solvent; 0.1 wt %-3 wt % of photoinitiator; and 0.01 wt %-3.5 wt % of additives.
Public/Granted literature
- US20110123723A1 PHOTOSENSITIVE RESIN COMPOSITION AND PREPARATION METHOD Public/Granted day:2011-05-26
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