Invention Grant
- Patent Title: Method for making light emitting diode
- Patent Title (中): 制造发光二极管的方法
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Application No.: US13288213Application Date: 2011-11-03
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Publication No.: US08476094B2Publication Date: 2013-07-02
- Inventor: Yang Wei , Shou-Shan Fan
- Applicant: Yang Wei , Shou-Shan Fan
- Applicant Address: CN Beijing TW New Taipei
- Assignee: Tsinghua University,Hon Hai Precision Industry Co., Ltd.
- Current Assignee: Tsinghua University,Hon Hai Precision Industry Co., Ltd.
- Current Assignee Address: CN Beijing TW New Taipei
- Agency: Altis Law Group, Inc.
- Priority: CN201110110728 20110429
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for making light emitting diode, the method includes the following steps. First, a substrate having an epitaxial growth surface is provided. Second, a carbon nanotube layer is suspended above the epitaxial growth surface. Third, a first semiconductor layer, an active layer and a second semiconductor layer are grown on the epitaxial growth surface in that order. Fourth, a portion of the second semiconductor layer and the active layer is etched to expose a portion of the first semiconductor layer. Fifth, a first electrode is prepared on the first semiconductor layer and a second electrode is prepared on the second semiconductor layer.
Public/Granted literature
- US20120276666A1 METHOD FOR MAKING LIGHT EMITTING DIODE Public/Granted day:2012-11-01
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