Invention Grant
- Patent Title: Method of fabricating a base layer circuit structure
- Patent Title (中): 制造基层电路结构的方法
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Application No.: US12580509Application Date: 2009-10-16
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Publication No.: US08474133B2Publication Date: 2013-07-02
- Inventor: Charles W. Eichelberger , James E. Kohl
- Applicant: Charles W. Eichelberger , James E. Kohl
- Applicant Address: US MA Woburn
- Assignee: EPIC Technologies, Inc.
- Current Assignee: EPIC Technologies, Inc.
- Current Assignee Address: US MA Woburn
- Agency: Heslin Rothenberg Farley & Mesiti P.C.
- Agent Kevin P. Radigan, Esq.
- Main IPC: H05K3/30
- IPC: H05K3/30

Abstract:
Methods of fabricating a base layer circuit structure are provided. One fabrication method includes: providing an alignment carrier having a support surface; forming a plurality of electrically conductive structures above the support surface of the alignment carrier; disposing a structural material around and physically contacting the side surfaces of the electrically conductive structures formed above the support surface, the structural material having an upper surface coplanar with or parallel to the upper surface of one or more of the electrically conductive structures; exposing, if covered, the upper surfaces of the electrically conductive structures to facilitate electrical connection to the structures; and separating the alignment carrier from the base layer circuit structure. The base layer circuit structure includes the plurality of electrically conductive structures and the structural material surrounding and physically contacting the electrically conductive structures.
Public/Granted literature
- US20100031500A1 METHOD OF FABRICATING A BASE LAYER CIRCUIT STRUCTURE Public/Granted day:2010-02-11
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