Invention Grant
- Patent Title: Illumination optical system, exposure apparatus, and device manufacturing method
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Application No.: US12252283Application Date: 2008-10-15
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Publication No.: US08462317B2Publication Date: 2013-06-11
- Inventor: Hirohisa Tanaka
- Applicant: Hirohisa Tanaka
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2007-269189 20071016
- Main IPC: G02B5/02
- IPC: G02B5/02 ; G03B27/32 ; G03B27/42 ; G03B27/54 ; G03B27/72

Abstract:
An illumination optical system for illuminating an irradiated plane M with illumination light provided from a light source includes a spatial light modulator, which is arranged in an optical path of the illumination optical system and forms a desired light intensity distribution at a pupil position of the illumination optical system or a position optically conjugated with the pupil position, and a diffuser, which is arranged at an incidence side of the spatial light modulator through which the illumination light enters.
Public/Granted literature
- US20090097007A1 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2009-04-16
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