Invention Grant
- Patent Title: Through silicon via impedance extraction
- Patent Title (中): 通过硅经阻抗提取
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Application No.: US13526443Application Date: 2012-06-18
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Publication No.: US08448115B1Publication Date: 2013-05-21
- Inventor: Vasileios Kourkoulos , Roberto Suaya
- Applicant: Vasileios Kourkoulos , Roberto Suaya
- Applicant Address: US OR Wilsonville
- Assignee: Mentor Graphics Corporation
- Current Assignee: Mentor Graphics Corporation
- Current Assignee Address: US OR Wilsonville
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
Aspects of the invention relate to techniques for extracting impedance values associated with through-silicon vias in an integrated circuit system. A function fitting process is performed to generate parameters of a representation for magneto-quasi-static dyadic vector potential Green's functions at a plurality of frequencies of interest based on integrated circuit manufacturing process information. Based on the generated parameters, a set of electric current basis functions and the layout information for a layout design of interest, matrix elements of a matrix for each frequency in the plurality of frequencies of interest may be computed. The matrix is a part of a linear system that formulates a relationship of electric current and electric potential difference in various regions associated with the through-silicon vias in the layout design. Based on the matrix, impedance values associated with the through-silicon vias are computed.
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