Invention Grant
- Patent Title: Substrate processing system and group management system
- Patent Title (中): 基板处理系统和组管理系统
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Application No.: US12805199Application Date: 2010-07-19
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Publication No.: US08447424B2Publication Date: 2013-05-21
- Inventor: Kazuhide Asai , Hiroyuki Iwakura
- Applicant: Kazuhide Asai , Hiroyuki Iwakura
- Applicant Address: JP Tokyo
- Assignee: Hitachi Kokusai Electric Inc.
- Current Assignee: Hitachi Kokusai Electric Inc.
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2007-096147 20070402; JP2008-030365 20080212
- Main IPC: G06F19/00
- IPC: G06F19/00 ; G06F15/173

Abstract:
It is intended to provide a substrate processing system and a group management system enabling a more flexible and simplified structure of substrate processing apparatuses. The substrate processing system according to this invention has a plurality of substrate processing apparatuses for processing substrates and the group management system connected to the substrate processing apparatuses, and the group management system includes a structure information memory device (structure management device) for memorizing structure information, a plurality of communication devices (connection management devices) for communicating with at least one of the plural substrate processing apparatuses based on the structure information memorized in the structure information memory device, and an apparatus information storage device (data management device) connected to any of the plural communication devices based on the structure information memorized in the structure information memory device and which stores information relating to the substrate processing apparatus performing communication with the communication device.
Public/Granted literature
- US20100324718A1 Substrate processing system and group management system Public/Granted day:2010-12-23
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