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US08445937B2 Barrier films for plastic substrates fabricated by atomic layer deposition 有权
通过原子层沉积制造的塑料基板的阻挡膜

Barrier films for plastic substrates fabricated by atomic layer deposition
Abstract:
Gas permeation barriers can be deposited on plastic or glass substrates by atomic layer deposition (ALD). The use of the ALD coatings can reduce permeation by many orders of magnitude at thicknesses of tens of nanometers with low concentrations of coating defects. These thin coatings preserve the flexibility and transparency of the plastic substrate. Such articles are useful in container, electrical and electronic applications.
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