Invention Grant
US08445937B2 Barrier films for plastic substrates fabricated by atomic layer deposition
有权
通过原子层沉积制造的塑料基板的阻挡膜
- Patent Title: Barrier films for plastic substrates fabricated by atomic layer deposition
- Patent Title (中): 通过原子层沉积制造的塑料基板的阻挡膜
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Application No.: US12055560Application Date: 2008-03-26
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Publication No.: US08445937B2Publication Date: 2013-05-21
- Inventor: Peter Francis Carcia , Robert Scott McLean
- Applicant: Peter Francis Carcia , Robert Scott McLean
- Applicant Address: US DE Wilmington
- Assignee: E I du Pont de Nemours and Company
- Current Assignee: E I du Pont de Nemours and Company
- Current Assignee Address: US DE Wilmington
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
Gas permeation barriers can be deposited on plastic or glass substrates by atomic layer deposition (ALD). The use of the ALD coatings can reduce permeation by many orders of magnitude at thicknesses of tens of nanometers with low concentrations of coating defects. These thin coatings preserve the flexibility and transparency of the plastic substrate. Such articles are useful in container, electrical and electronic applications.
Public/Granted literature
- US20080182101A1 BARRIER FILMS FOR PLASTIC SUBSTRATES FABRICATED BY ATOMIC LAYER DEPOSITION Public/Granted day:2008-07-31
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