Invention Grant
- Patent Title: Method and apparatus for pattern-coating
- Patent Title (中): 图案涂层的方法和装置
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Application No.: US12724870Application Date: 2010-03-16
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Publication No.: US08445068B2Publication Date: 2013-05-21
- Inventor: Migaku Suzuki , Toa Kobayashi , Reiko Moriya , Satoru Wakabayashi , Satoshi Ukawa
- Applicant: Migaku Suzuki , Toa Kobayashi , Reiko Moriya , Satoru Wakabayashi , Satoshi Ukawa
- Applicant Address: VG Tortola
- Assignee: DSG International Limited
- Current Assignee: DSG International Limited
- Current Assignee Address: VG Tortola
- Agency: Frommer Lawrence & Haug LLP
- Agent Ronald R. Santucci
- Main IPC: B05D3/12
- IPC: B05D3/12

Abstract:
A method for coating a dispersion slurry containing a solid SAP dispersed in a dispersion medium on a surface of a substrate sheet are provided. The method is characterized in that a first region and a second region are formed on the surface of the substrate sheet with a convex-and-concave pattern wherein the first region have the coating layer in thicker thickness and the second region have the coating layer in thinner thickness or does not scarcely have the coating layer, by means of positioning the rotating pattern roll over the substrate sheet via the cover film, of supplying the dispersion slurry between the substrate sheet and the cover film while rotating the rotating pattern roll, and of pushing the coating layer with the rotating pattern roll via the cover film, when the coating layer of the dispersion slurry is formed.
Public/Granted literature
- US20100173080A1 METHOD AND APPARATUS FOR PATTERN-COATING Public/Granted day:2010-07-08
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