Invention Grant
- Patent Title: Projection objective for microlithography
- Patent Title (中): 微光刻的投影目标
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Application No.: US12723496Application Date: 2010-03-12
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Publication No.: US08436982B2Publication Date: 2013-05-07
- Inventor: Helmut Beierl , Heiko Feldmann , Jochen Hetzler , Michael Totzeck
- Applicant: Helmut Beierl , Heiko Feldmann , Jochen Hetzler , Michael Totzeck
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102007047148 20071002
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/52 ; G03B27/42

Abstract:
A projection objective for microlithography includes at least one optical assembly with optical elements which are disposed between an object plane and an image plane. The optical assembly includes at least one optical terminal element, which is disposed close to the image plane. A first immersion liquid is disposed on the image oriented surface of the optical terminal element. A second immersion liquid is disposed on the object oriented surface of the optical terminal element. The object oriented surface includes a first surface section for the imaging light to enter into the terminal element, and the image oriented surface includes a second surface portion for the imaging light to exit from the terminal element.
Public/Granted literature
- US20100201959A1 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY Public/Granted day:2010-08-12
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