Invention Grant
- Patent Title: Exposure apparatus, and device manufacturing method
- Patent Title (中): 曝光装置和装置制造方法
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Application No.: US12923718Application Date: 2010-10-05
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Publication No.: US08436979B2Publication Date: 2013-05-07
- Inventor: Akimitsu Ebihara
- Applicant: Akimitsu Ebihara
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2003-174259 20030619
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52

Abstract:
An immersion liquid is supplied to a space between a projection system and a substrate, and a patterned beam of radiation is projected through the liquid onto a target portion of the substrate using the projection system. Substrates can be held on first and second tables. The first and second tables are moved together so as to transit from a first state to a second state, the first state in which the liquid immersion is maintained between the projection system and one of the first and second tables, the second state in which the liquid immersion is maintained between the projection system and the other one of the first and second tables. During the transition, the liquid immersion is maintained just below the projection system.
Public/Granted literature
- US20110025997A1 Exposure apparatus, and device manufacturing method Public/Granted day:2011-02-03
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