Invention Grant
- Patent Title: System and method for integrated inductor
- Patent Title (中): 集成电感的系统和方法
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Application No.: US12686164Application Date: 2010-01-12
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Publication No.: US08436707B2Publication Date: 2013-05-07
- Inventor: Carsten Ahrens , Gunther Mackh , Klemens Pruegl
- Applicant: Carsten Ahrens , Gunther Mackh , Klemens Pruegl
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01F27/02
- IPC: H01F27/02

Abstract:
In one embodiment, an inductor has a substrate, a conductor disposed above the substrate and a seamless ferromagnetic material surrounding at least a first portion of the conductor.
Public/Granted literature
- US20110169596A1 System and Method for Integrated Inductor Public/Granted day:2011-07-14
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