Disclosed is a semiconductor device suppressed in decrease of reliability. The semiconductor device comprises an electrode pad portion formed on the upper surface of a semiconductor substrate, a passivation layer so formed on the upper surface of the semiconductor substrate as to overlap a part of the electrode pad portion and having a first opening portion where the upper surface of the electrode pad portion is exposed, a barrier metal layer formed on the electrode pad portion, and a solder bump formed on the barrier metal layer. The barrier metal layer is formed such that an outer peripheral end lies within the first opening portion of the passivation layer when viewed in plan.